Design and fabrication of a reflection far-ultraviolet polarizer and retarder

Details Design and fabrication of a reflection far-ultraviolet polarizer and retarder Design and fabrication of a reflection far-ultraviolet polarizer and retarder

Feb 1994

adsabs.harvard.edu/cgi-bin/nph-data_query?bibcode=1994spie.2010...93k&link_type=abstract

Proc. SPIE Vol. 2010, p. 93-103, X-Ray and Ultraviolet Polarimetry, Silvano Fineschi; Ed.

Physics

2

Scientific paper

New methods have been developed for the design of a far ultraviolet multilayer reflection polarizer and retarder. A MgF(subscript 2)/Al/MgF(subscript 2) three-layer structure deposited on a thick opaque Al film (substrate) is used for the design of polarizers and retarders. The induced transmission and absorption method is used for the design of a polarizer and layer-by-layer electric field calculation method is used for the design of a quarterwave retarder. In order to fabricate these designs in a conventional high vacuum chamber we have to minimize the oxidation of the Al layers and somehow characterize the oxidized layer. X-ray photoelectron spectroscopy is used to investigate the amount and profile of oxidation. Depth profiling results and a seven layer oxidation model are presented.

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