CVD silicon carbide mirrors for EUV applications

Details CVD silicon carbide mirrors for EUV applications CVD silicon carbide mirrors for EUV applications

Oct 1995

adsabs.harvard.edu/cgi-bin/nph-data_query?bibcode=1995spie.2543..173k&link_type=abstract

Proc. SPIE Vol. 2543, p. 173-179, Silicon Carbide Materials for Optics and Precision Structures, Mark A. Ealey; Ed.

Physics

Optics

1

Scientific paper

Advances in optical coating and materials technology have made possible the development of instruments with substantially improved efficiency in the extreme ultraviolet (EUV). For example, the development of chemical vapor deposited (CVD) SiC mirrors provides an opportunity to extend the range of normal incidence instruments down to 60 nm. CVD-SiC is a highly polishable material yielding low scatter surfaces. High UV reflectivity and desirable mechanical and thermal properties make CVD-SiC an attractive mirror and/or coating material for EUV applications. The EUV performance of SiC mirrors as well as some strengths and problem areas are discussed.

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