CoO1-δ layers in a reactively sputtered exchange-bias system

Details CoO1-δ layers in a reactively sputtered exchange-bias system CoO1-δ layers in a reactively sputtered exchange-bias system

Aug 2008

adsabs.harvard.edu/cgi-bin/nph-data_query?bibcode=2008njph...10h3028r&link_type=abstract

New Journal of Physics, Volume 10, Issue 8, pp. 083028 (2008).

Physics

1

Scientific paper

In exchange-bias (EB) systems involving CoO as the antiferromagnetic (AF) component, preparation of overoxidized (i.e. CoO1+δ) AF layers has previously been shown to have an important effect on EB properties, which arises due to point defects associated with the non-stoichiometric material. Here, we present a study on the effect of post-deposition annealing to progressively higher temperatures, Tann, on magnetic and structural parameters of a [Co/CoO/Ag]30 multilayer. Our results indicate a different AF layer stoichiometry: CoO1-δ (i.e. underoxidized), with δ=0.1 for the as-deposited sample. The annealing behaviour of the different parameters is explained via a mechanism of thermally induced diffusion of Co ions from the oxide to the Co layers, which is initiated at Tann≈300 °C (=T*) and leads to the approach to stoichiometry (i.e. Co1O1) in the AF layers. We suggest why our sample preparation conditions could have led to this unusual (i.e. CoO1-δ) stoichiometry and comment on possible future studies.

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