Controlling surface statistical properties using bias voltage: Atomic force microscopy and stochastic analysis

Details Controlling surface statistical properties using bias voltage: Atomic force microscopy and stochastic analysis Controlling surface statistical properties using bias voltage: Atomic force microscopy and stochastic analysis

2007-04-08

arxiv.org/abs/0704.1029v1

PHYSICAL REVIEW B 71, 155423 (2005)

Physics

Data Analysis, Statistics and Probability

8 pages, 11 figures;

Scientific paper

The effect of bias voltages on the statistical properties of rough surfaces has been studied using atomic force microscopy technique and its stochastic analysis. We have characterized the complexity of the height fluctuation of a rough surface by the stochastic parameters such as roughness exponent, level crossing, and drift and diffusion coefficients as a function of the applied bias voltage. It is shown that these statistical as well as microstructural parameters can also explain the macroscopic property of a surface. Furthermore, the tip convolution effect on the stochastic parameters has been examined.

Affiliated with

Also associated with

No associations

Rating

Controlling surface statistical properties using bias voltage: Atomic force microscopy and stochastic analysis does not yet have a rating. At this time, there are no reviews or comments for this scientific paper.

If you have personal experience with Controlling surface statistical properties using bias voltage: Atomic force microscopy and stochastic analysis, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Controlling surface statistical properties using bias voltage: Atomic force microscopy and stochastic analysis will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFWR-SCP-O-168525