Characterization of Titanium films for low temperature detectors

Details Characterization of Titanium films for low temperature detectors Characterization of Titanium films for low temperature detectors

Feb 2002

adsabs.harvard.edu/cgi-bin/nph-data_query?bibcode=2002aipc..605..181m&link_type=abstract

LOW TEMPERATURE DETECTORS: Ninth International Workshop on Low Temperature Detectors. AIP Conference Proceedings, Volume 605, p

Other

4

Superconducting Optical, X-Ray, And Gamma-Ray Detectors

Scientific paper

In this work we study Ti films, with thickness between 10 nm and 1000 nm, deposited by e-gun on silicon nitride. Critical temperatures and electrical resistivities of these films have been measured and related each other. The behavior of critical temperatures versus the residual resistivities is discussed in the frame of the Testardi and Mattheiss theory .

Affiliated with

Also associated with

No associations

Rating

Characterization of Titanium films for low temperature detectors does not yet have a rating. At this time, there are no reviews or comments for this scientific paper.

If you have personal experience with Characterization of Titanium films for low temperature detectors, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Characterization of Titanium films for low temperature detectors will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFWR-SCP-O-1790857