Characterization of molybdenum/silicon multilayers deposited by ion beam sputtering and RF magnetron sputtering

Details Characterization of molybdenum/silicon multilayers deposited by ion beam sputtering and RF magnetron sputtering Characterization of molybdenum/silicon multilayers deposited by ion beam sputtering and RF magnetron sputtering

Jan 1993

adsabs.harvard.edu/cgi-bin/nph-data_query?bibcode=1993spie.1742..614m&link_type=abstract

Proc. SPIE Vol. 1742, p. 614-620, Multilayer and Grazing Incidence X-Ray/EUV Optics for Astronomy and Projection Lithography, Ri

Physics

Optics

4

Scientific paper

Molybdenum/silicon multilayers were deposited by ion beam sputtering and radio-frequency magnetron sputtering. X-ray reflection, transmission electron microscopy and Auger electron spectroscopy studies were performed to characterize these multilayers. There was a difference in soft x-ray reflectivity. The reason for the difference was found to be the difference in the thickness of silicide layers which were formed at each interface of the multilayers.

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