Atomic photoionization in combined intense XUV free-electron and infrared laser fields

Details Atomic photoionization in combined intense XUV free-electron and infrared laser fields Atomic photoionization in combined intense XUV free-electron and infrared laser fields

Apr 2012

adsabs.harvard.edu/cgi-bin/nph-data_query?bibcode=2012njph...14d3008r&link_type=abstract

New Journal of Physics, Volume 14, Issue 4, pp. 043008 (2012).

Physics

Scientific paper

We present a systematic study of the photoionization of noble gas atoms exposed simultaneously to ultrashort (20 fs) monochromatic (1–2% spectral width) extreme ultraviolet (XUV) radiation from the Free-electron Laser in Hamburg (FLASH) and to intense synchronized near-infrared (NIR) laser pulses with intensities up to about 1013 W cm‑2. Already at modest intensities of the NIR dressing field, the XUV-induced photoionization lines are split into a sequence of peaks due to the emission or absorption of several additional infrared photons. We observed a plateau-shaped envelope of the resulting sequence of sidebands that broadens with increasing intensity of the NIR dressing field. All individual lines of the nonlinear two-color ionization process are Stark-shifted, reflecting the effective intensity of the NIR field. The intensity-dependent cut-off energies of the sideband plateau are in good agreement with a classical model. The detailed structure of the two-color spectra, including the formation of individual sidebands, the Stark shifts and the contributions beyond the classical cut-off, however, requires a fully quantum mechanical description, as is demonstrated with time-dependent quantum calculations in single-active electron approximation.

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