Atomic hydrogen cleaning of GaAs photocathode with a load-lock system

Details Atomic hydrogen cleaning of GaAs photocathode with a load-lock system Atomic hydrogen cleaning of GaAs photocathode with a load-lock system

Jun 2001

adsabs.harvard.edu/cgi-bin/nph-data_query?bibcode=2001aipc..570.1018y&link_type=abstract

The fourteenth international spin physics symposium, SPIN2000. AIP Conference Proceedings, Volume 570, pp. 1018-1020 (2001).

Physics

Electron Sources, Polarized Beams, Photomultipliers, Phototubes And Photocathodes, Electrostatic, Collective, And Linear Accelerators

Scientific paper

We are constructing a new polarized electron source for Japan Linear Collider. It is designed to operate the gun at 200 kV. The ``load-lock'' mechanism is employed to avoid the dark current due to the Cs accumulation on the electrodes and to exchange the activated NEA photocathode quickly. We have developed superlattice photocathode which has advantages of high spin polarization, high quantum efficiency and high resistance against surface charge limit phenomenon. However, it seems difficult to clean the surface of such a thin layer photocathode by the normal etching procedure without destruction of its delicate structure if it has no As caplayer. Atomic hydrogen is expected to clean the surface of superlattice effectively. We have introduced these techniques to the new source design. .

Affiliated with

Also associated with

No associations

Rating

Atomic hydrogen cleaning of GaAs photocathode with a load-lock system does not yet have a rating. At this time, there are no reviews or comments for this scientific paper.

If you have personal experience with Atomic hydrogen cleaning of GaAs photocathode with a load-lock system, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Atomic hydrogen cleaning of GaAs photocathode with a load-lock system will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFWR-SCP-O-1581640