Aspheric surface figuring of silicon using plasma-assisted chemical etching

Details Aspheric surface figuring of silicon using plasma-assisted chemical etching Aspheric surface figuring of silicon using plasma-assisted chemical etching

Sep 1995

adsabs.harvard.edu/cgi-bin/nph-data_query?bibcode=1995spie.2542..231h&link_type=abstract

Proc. SPIE Vol. 2542, p. 231-235, Optomechanical and Precision Instrument Design, Alson E. Hatheway; Ed.

Physics

Optics

Scientific paper

OCA Applied Optics has developed and demonstrated a rapid, automated technique for the surface figuring of precision aspheric silicon and silicon-clad optical elements using a patented plasma assisted chemical etching (PACE) methodology. In this paper we discuss the preprocessing methods and suitable PACE removal depth strategies to ensure that final PACE- finished silicon surfaces meet current low-scatter optical standards. An aspheric surface figuring model for the PACE process is also described.

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