Aspheric surface figuring of fused silica using plasma-assisted chemical etching

Details Aspheric surface figuring of fused silica using plasma-assisted chemical etching Aspheric surface figuring of fused silica using plasma-assisted chemical etching

Sep 1995

adsabs.harvard.edu/cgi-bin/nph-data_query?bibcode=1995spie.2542..220h&link_type=abstract

Proc. SPIE Vol. 2542, p. 220-230, Optomechanical and Precision Instrument Design, Alson E. Hatheway; Ed.

Physics

Optics

1

Scientific paper

OCA Applied Optics has developed and demonstrated a rapid, automated technique for the fuguring of precision aspheric surfaces on fused silica optical elements using plasma assisted chemical etching (PACE) methodology. In this paper we discuss the pre-processing methods and suitable PACE removal depth strategies for fused silica necessary to ensure that final PACE-finished surfaces meet current low-scatter optical standards. We also describe models for aspheric surface figuring using the patented PACE process which account for substrate dielectric losses and other effects and allow us to define the parameters needed to efficiently correct surface figure errors. FInally, we demonstrate the capabilities of the final PACE figuring method on a fused silica test substrate.

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