Analysis of Barrier Defects in Low- k/Cu Interconnects Based on Electrochemical Response and Simulation Cell

Details Analysis of Barrier Defects in Low- k/Cu Interconnects Based on Electrochemical Response and Simulation Cell Analysis of Barrier Defects in Low- k/Cu Interconnects Based on Electrochemical Response and Simulation Cell

Apr 2008

adsabs.harvard.edu/cgi-bin/nph-data_query?bibcode=2008jemat..37..429m&link_type=ejournal

Journal of Electronic Materials, Volume 37, Issue 4, pp.429-438

Physics

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