An Efficient Molecular Dynamics Scheme for the Calculation of Dopant Profiles due to Ion Implantation

Physics – Computational Physics

Scientific paper

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

17 pages, 21 figures, 2 tables. See: http://bifrost.lanl.gov/~reed/

Scientific paper

10.1103/PhysRevE.57.7278

We present a highly efficient molecular dynamics scheme for calculating the concentration depth profile of dopants in ion irradiated materials. The scheme incorporates several methods for reducing the computational overhead, plus a rare event algorithm that allows statistically reliable results to be obtained over a range of several orders of magnitude in the dopant concentration. We give examples of using this scheme for calculating concentration profiles of dopants in crystalline silicon. Here we can predict the experimental profile over five orders of magnitude for both channeling and non-channeling implants at energies up to 100s of keV. The scheme has advantages over binary collision approximation (BCA) simulations, in that it does not rely on a large set of empirically fitted parameters. Although our scheme has a greater computational overhead than the BCA, it is far superior in the low ion energy regime, where the BCA scheme becomes invalid.

No associations

LandOfFree

Say what you really think

Search LandOfFree.com for scientists and scientific papers. Rate them and share your experience with other people.

Rating

An Efficient Molecular Dynamics Scheme for the Calculation of Dopant Profiles due to Ion Implantation does not yet have a rating. At this time, there are no reviews or comments for this scientific paper.

If you have personal experience with An Efficient Molecular Dynamics Scheme for the Calculation of Dopant Profiles due to Ion Implantation, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and An Efficient Molecular Dynamics Scheme for the Calculation of Dopant Profiles due to Ion Implantation will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFWR-SCP-O-599273

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.