Physics – Optics
Scientific paper
Jul 1988
adsabs.harvard.edu/cgi-bin/nph-data_query?bibcode=1988apopt..27.2841k&link_type=abstract
Applied Optics (ISSN 0003-6935), vol. 27, July 15, 1988, p. 2841-2846. USAF-sponsored research.
Physics
Optics
30
Amorphous Materials, Extreme Ultraviolet Radiation, Magnetron Sputtering, Protective Coatings, Silicon Carbides, Thin Films, X Ray Scattering, Backscattering, Bandwidth, Reflectance, X Ray Diffraction
Scientific paper
Amorphous silicon carbide films formed by sputtering techniques are shown to have high reflectance in the extreme ultraviolet spectral region. X-ray scattering verifies that the atomic arrangements in these films are amorphous, while Auger electron spectroscopy and Rutherford backscattering spectroscopy show that the films have composition close to stoichiometric SiC, although slightly C-rich, with low impurity levels. Reflectance vs incidence angle measurements from 24 to 1216 A were used to derive optical constants of this material, which are presented here. Additionally, the measured extreme ultraviolet efficiency of a diffraction grating overcoated with sputtered amorphous silicon carbide is presented, demonstrating the feasibility of using these films as coatings for EUV optics.
Kortright Jeffrey B.
Windt David L.
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