Advanced x-ray optics with Si wafers and slumped glass

Details Advanced x-ray optics with Si wafers and slumped glass Advanced x-ray optics with Si wafers and slumped glass

Aug 2009

adsabs.harvard.edu/cgi-bin/nph-data_query?bibcode=2009spie.7437e..25h&link_type=abstract

Optics for EUV, X-Ray, and Gamma-Ray Astronomy IV. Edited by Hudec, R.; Marsikova, V.; Mika, M.; Sik, J.; Lorenc, M.; Pina, L.;

Physics

Optics

Scientific paper

We report on the continuation of the development of test samples of astronomical x-ray optics based on thermally formed glass foils and on bent Si wafers. Experiments with thermal glass forming have continued adding wider range of evaluated and optimized parameters including viscosity and internal stress analyses, as well as investigation of mounting influences. Experiments with Si wafers focused on their quality improvements such as flatness and thickness uniformity in order to better meet the requirements of future X-ray astronomy projects applications, as well as on study of their surface quality, defects analysis, and methods for its reproducible measurement.

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