Accurate modeling of periodic and graded multilayer x-ray scattering from surface microroughness characterization

Details Accurate modeling of periodic and graded multilayer x-ray scattering from surface microroughness characterization Accurate modeling of periodic and graded multilayer x-ray scattering from surface microroughness characterization

Sep 2011

adsabs.harvard.edu/cgi-bin/nph-data_query?bibcode=2011spie.8147e..33s&link_type=abstract

Optics for EUV, X-Ray, and Gamma-Ray Astronomy V. Edited by O'Dell, Stephen L.; Pareschi, Giovanni. Proceedings of the SPIE, V

Physics

Optics

Scientific paper

Several hard X-ray imaging telescopes of the next future will be characterized by a high angular resolution. To this end, it is necessary to produce optics with a very low surface microroughness, as this is responsible of X-ray scattering, which results in image quality degradation especially at the higher energies. To the smooth surface approximation, it is possible to compute the X-Ray Scattering (XRS) from the Power Spectral Density (PSD) of the surface roughness. Indeed, multilayers coatings will be used to reflect X-rays beyond 10 keV; in this case the scattering pattern is more complicated but it can still be computed from the PSDs of each interface and the cross-correlation functions of the rough profiles. A growth model able to describe the roughness evolution of the surfaces enables us to compute the XRS of the multilayer, which can be directly compared to the experimental data. With this approach we aim to validate the roughening model assumed and to accurately predict the scattering pattern we expect on the focal plane. In this work we show the application of this formalism: direct measurements of the PSDs for the substrate and the outermost layer of a multilayer sample are used as input for the code to model the PSD growth. XRS measurements of that sample, performed at the energy of 8.05 keV, are presented to validate the modeling achieved.

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