Physics – Quantum Physics
Scientific paper
2008-08-18
J.Phys.A: Math. Theor. 40 (2007) 13453
Physics
Quantum Physics
Scientific paper
10.1088/1751-8113/40/44/022
Using the plasma model for the metal dielectric function we have calculated the electromagnetic fluctuation induced forces on a free standing metallic film in vacuum as a function of the film size and the plasma frequency. The force for unit area is attractive and for a given film thickness it shows an intensity maximum at a specific plasma value, which cannot be predicted on the basis of a non retarded description of the electromagnetic interaction. If the film is deposited on a substrate or interacts with a plate, both the sign and the value of the force are modified. It is shown that the force can change sign from attraction to repulsion upon changing the substrate plasma frequency. A detailed comparison between the force on the film boundaries and the force between film and substrate indicates that, for 50-100 nm thick films, they are comparable when film-substrate distance is of the order of the film thickness.
Benassi Andrea
Calandra Carlo
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