Physics
Scientist
ASML MaskTools, Inc., USA
ASML, USA and Motorola, USA
Application of CPL with Interference Mapping Lithography to generate random contact reticle designs for the 65-nm node
Complex 2D pattern lithography at lambda/4 resolution using chromeless phase lithography (CPL)
Contact hole reticle optimization by using interference mapping lithography (IML)
Contact hole reticle optimization by using interference mapping lithography (IML)
Near-0.3 k1 full pitch range contact hole patterning using chromeless phase lithography (CPL)
No associations
LandOfFree
Douglas J. Van Den Broeke does not yet have a rating. At this time, there are no reviews or comments for this scientist.
If you have personal experience with Douglas J. Van Den Broeke, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Douglas J. Van Den Broeke will most certainly appreciate the feedback.
Profile ID: LFWR-SCP-P-661142