Fabrication of Genesis Sample Simulants Using Plasma Source Ion Implantation (PSII)

Details Fabrication of Genesis Sample Simulants Using Plasma Source Ion Implantation (PSII) Fabrication of Genesis Sample Simulants Using Plasma Source Ion Implantation (PSII)

Mar 2002

adsabs.harvard.edu/cgi-bin/nph-data_query?bibcode=2002lpi....33.1899k&link_type=abstract

33rd Annual Lunar and Planetary Science Conference, March 11-15, 2002, Houston, Texas, abstract no.1899

Physics

Scientific paper

Plasma source ion implantation can be used to fabricate simulant samples
for the Genesis mission. These simulants will be needed by investigators
to validate sample preparation and analysis techniques for the returned
Genesis samples.

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