Valence of Ti and V in Fassaite: A Recorder of Oxygen Fugacity During Crystallization of Coarse-grained Refractory Inclusions

Details Valence of Ti and V in Fassaite: A Recorder of Oxygen Fugacity During Crystallization of Coarse-grained Refractory Inclusions Valence of Ti and V in Fassaite: A Recorder of Oxygen Fugacity During Crystallization of Coarse-grained Refractory Inclusions

Sep 2005

adsabs.harvard.edu/cgi-bin/nph-data_query?bibcode=2005lpico1278...35s&link_type=article

Workshop on Oxygen in the Earliest Solar System, held September 19-21, 2005 in Gatlinburg, Tennessee, LPI Contribution No. 1278.

Physics

Scientific paper

Not Available

Affiliated with

Also associated with

No associations

Rating

Valence of Ti and V in Fassaite: A Recorder of Oxygen Fugacity During Crystallization of Coarse-grained Refractory Inclusions does not yet have a rating. At this time, there are no reviews or comments for this scientific paper.

If you have personal experience with Valence of Ti and V in Fassaite: A Recorder of Oxygen Fugacity During Crystallization of Coarse-grained Refractory Inclusions, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Valence of Ti and V in Fassaite: A Recorder of Oxygen Fugacity During Crystallization of Coarse-grained Refractory Inclusions will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFWR-SCP-O-758552