Reduced basis method for computational lithography

Details Reduced basis method for computational lithography Reduced basis method for computational lithography

2010-11-11

arxiv.org/abs/1011.2654v1

Proc. SPIE Vol. 7488 (2009) 74882B

Physics

Optics

BACUS Photomask Technology 2009

Scientific paper

10.1117/12.829639

A bottleneck for computational lithography and optical metrology are long computational times for near field simulations. For design, optimization, and inverse scatterometry usually the same basic layout has to be simulated multiple times for different values of geometrical parameters. The reduced basis method allows to split up the solution process of a parameterized model into an expensive offline and a cheap online part. After constructing the reduced basis offline, the reduced model can be solved online very fast in the order of seconds or below. Error estimators assure the reliability of the reduced basis solution and are used for self adaptive construction of the reduced system. We explain the idea of reduced basis and use the finite element solver JCMsuite constructing the reduced basis system. We present a 3D optimization application from optical proximity correction (OPC).

Affiliated with

Also associated with

No associations

Rating

Reduced basis method for computational lithography does not yet have a rating. At this time, there are no reviews or comments for this scientific paper.

If you have personal experience with Reduced basis method for computational lithography, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Reduced basis method for computational lithography will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFWR-SCP-O-431021