Chemistry and dynamics of SF6 injections into the F region

Details Chemistry and dynamics of SF6 injections into the F region Chemistry and dynamics of SF6 injections into the F region

Jun 1984

adsabs.harvard.edu/cgi-bin/nph-data_query?bibcode=1984jgr....89.3929b&link_type=abstract

Journal of Geophysical Research (ISSN 0148-0227), vol. 89, June 1, 1984, p. 3929-3937. Research sponsored by the U.S. Department

Physics

20

Atmospheric Chemistry, F Region, Molecular Ions, Space Plasmas, Sulfur Fluorides, Airglow, Electron Attachment, Infrared Spectroscopy, Negative Ions, Oxygen Ions, Positive Ions, Vapor Phases

Scientific paper

The chemistry of SF6 vapor reacting in the F region is critically examined. The SF6 molecule dissociatively attaches an electron, producing the SF5(-) ion. Reaction between an ambient O(+) ion and the SF5(-) yields mutual neutralization. During the neutralization process, an electronically excited oxygen atom, O(1D), may be produced which will subsequently emit a 630.0-nm photon. A release of 20 kg of SF6 into an ambient O(+) ion concentration of 100,000/cu cm at 300-km altitude is considered. The 630.0-nm airglow intensity may increase following the release. The negative ion plasma is shown to be marginally unstable to a gradient drift instability.

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