Recent progress with x-ray optics based on Si wafers and glass foils

Details Recent progress with x-ray optics based on Si wafers and glass foils Recent progress with x-ray optics based on Si wafers and glass foils

Aug 2008

adsabs.harvard.edu/cgi-bin/nph-data_query?bibcode=2008spie.7011e..35h&link_type=abstract

Space Telescopes and Instrumentation 2008: Ultraviolet to Gamma Ray. Edited by Turner, Martin J. L.; Flanagan, Kathryn A. Pr

Physics

Optics

1

Scientific paper

We report on recent progress with development of astronomical X-ray optics based on thermally formed glass foils and on bent Si wafers. Experiments with thermal glass forming have continued adding wider range of evaluated and optimized parameters. Recent efforts with Si wafers have been focused on their quality improvements such as flatness and thickness uniformity in order to better meet the requirements of future X-ray astronomy projects applications, as well as on study of their surface quality, defects analysis, and methods for its reproducible measurement. The role of substrates quality in performance of final mirror arrays, as required by large future space X-ray astronomy experiments was also studied. The problem of increasing size of Si wafers, required for some X-ray optics applications, is also addressed. First results of irradiation tests of selected substrates are also reported and discussed.

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