Quantum interferometric optical lithography:towards arbitrary two-dimensional patterns

Details Quantum interferometric optical lithography:towards arbitrary two-dimensional patterns Quantum interferometric optical lithography:towards arbitrary two-dimensional patterns

2000-11-21

arxiv.org/abs/quant-ph/0011088v2

Phys. Rev. A 63, 063407 (2001)

Physics

Quantum Physics

9 pages, 5 figures Revtex

Scientific paper

10.1103/PhysRevA.63.063407

As demonstrated by Boto et al. [Phys. Rev. Lett. 85, 2733 (2000)], quantum
lithography offers an increase in resolution below the diffraction limit. Here,
we generalize this procedure in order to create patterns in one and two
dimensions. This renders quantum lithography a potentially useful tool in
nanotechnology.

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