Surface study of HF- and HF / H 2 SO 4 -treated feldspar using Auger electron spectroscopy

Details Surface study of HF- and HF / H 2 SO 4 -treated feldspar using Auger electron spectroscopy Surface study of HF- and HF / H 2 SO 4 -treated feldspar using Auger electron spectroscopy

Jul 1983

adsabs.harvard.edu/cgi-bin/nph-data_query?bibcode=1983gecoa..47.1289p&link_type=abstract

Geochimica et Cosmochimica Acta, vol. 47, Issue 7, pp.1289-1291

Physics

1

Scientific paper

Auger electron spectroscopy has been used to study K-feldspar that has been reacted with both aqueous 10% HF and a 50% mixture of a 10% HF/0.1 N H 2 SO 4 solution. In the feldspar/HF system, the resulting feldspar surface was shown to have been fluorinated; depth profiling, using argon ion sputtering, showed the fluorination to have occurred substantially into the mineral bulk. In the feldspar/ HF / H 2 SO 4 system, the resulting surface contained both fluorine and sulfur. The fluorination had again penetrated into the bulk, but the sulfur could be removed with mild argon ion sputtering. The Al / F signal ratio was much lower on the feldspar surface treated with the 10% HF/0.1 N H 2 SO 4 solution than the feldspar surface treated with the weaker 10% HF acid solution.

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