Fast Flux Reversal in Laminated Nickel-Iron Thin Films

Details Fast Flux Reversal in Laminated Nickel-Iron Thin Films Fast Flux Reversal in Laminated Nickel-Iron Thin Films

Nov 1964

adsabs.harvard.edu/cgi-bin/nph-data_query?bibcode=1964natur.204..769h&link_type=abstract

Nature, Volume 204, Issue 4960, pp. 769-770 (1964).

Physics

3

Scientific paper

THIS communication deals with fast flux reversal in 80-20 nickel-iron films laminated with silicon monoxide. The magnetization curves of such films were shown by Clow1 to be characterized by very low coercive forces. The laminated film used in this measurement consisted of ten laminations of nickel-iron, each 200 Å thick, separated by silicon monoxide of about half the nickel-iron thickness. The silicon monoxide and nickel-iron layers were deposited alternately using a differential shutter. A control film was deposited at the same time but screened from the silicon monoxide, and therefore was essentially a solid film of nickel-iron 2000 Å thick. The films were 1 cm diameter spots evaporated on to glass substrates at 320° C in a pressure of about 1 × 10-5 mm mercury. The nickel-iron deposition rate was 25 Å/sec. The laminated films had an easy direction coercivity, Hc = 0.17 œrsteds, and an anisotropy field, HK = 3.9 œrsteds, while the control films had Hc = 0.76 œrsteds and HK = 3.4 œrsteds.

Affiliated with

Also associated with

No associations

Rating

Fast Flux Reversal in Laminated Nickel-Iron Thin Films does not yet have a rating. At this time, there are no reviews or comments for this scientific paper.

If you have personal experience with Fast Flux Reversal in Laminated Nickel-Iron Thin Films, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Fast Flux Reversal in Laminated Nickel-Iron Thin Films will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFWR-SCP-O-1342847