Physics – Optics
Scientific paper
Feb 1991
adsabs.harvard.edu/cgi-bin/nph-data_query?bibcode=1991spie.1343..229s&link_type=abstract
IN: X-ray/EUV optics for astronomy, microscopy, polarimetry, and projection lithography; Proceedings of the Meeting, San Diego,
Physics
Optics
2
Extreme Ultraviolet Radiation, Mirrors, Photolithography, Projection, X Rays, Asphericity, High Resolution, Microscopes, Modulation Transfer Function, Optical Reflection
Scientific paper
Several configurations of two- to four-multilayer mirror systems that have been proposed for use in soft-X-ray projection lithography are examined. The performance capabilities of spherical and aspherical two-mirror projection systems are compared, and a two-spherical-mirror four-reflection system that can resolve 0.1-micron features over a 10 x 10 mm field is described. It is emphasized that three-mirror systems show promise of high resolution in telescope applications, but have not been fully analyzed for projection lithography applications. It has been shown that a four-mirror aspheric system can be designed to meet the resolution requirements, but a trade-off must be made between reducing distortion below 10 microns over the field of view and increasing the modulation transfer function greater than 50 percent at spatial frequency of 5000 cycles/mm.
Shealy David L.
Viswanathan V. K.
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