Physics
Scientific paper
Feb 1991
adsabs.harvard.edu/cgi-bin/nph-data_query?bibcode=1991jajap..30l.145i&link_type=abstract
Japanese Journal of Applied Physics, Volume 30, Issue 2A, pp. L145-L148 (1991).
Physics
2
Scientific paper
A two-dimensional device simulator VENUS-2D/B for amorphous silicon thin-film transistors has been developed. For the efficient numerical simulation of amorphous silicon devices, the trapped electron density in the band gap is modeled by the combination of exponential functions. The current-voltage characteristics of an inverted-gate hydrogenerated amorphous silicon thin-film transistor were simulated by VENUS-2D/B.
Hirose Masataka
Iriye Yasuroh
Ishizuka Tatsumi
Sumino Kazuki
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