Present and future requirements of soft x-ray projection lithography

Details Present and future requirements of soft x-ray projection lithography Present and future requirements of soft x-ray projection lithography

Jan 1993

adsabs.harvard.edu/cgi-bin/nph-data_query?bibcode=1993spie.1742..576k&link_type=abstract

Proc. SPIE Vol. 1742, p. 576-584, Multilayer and Grazing Incidence X-Ray/EUV Optics for Astronomy and Projection Lithography, Ri

Physics

Optics

1

Scientific paper

A soft-X-ray projection lithography system using multilayer mirrors has been developed. To determine the feasibility of a high throughput and a large exposure area, a reduction system consisting of two-mirror optics and a reflection mask were designed, fabricated, and assembled; and some trial replications of fine patterns were carried out. A full 4-inch wafer reflection mask was fabricated using a new process, and a high contrast and uniform quality throughout was obtained. Using the reflection mask, fine patterns of less than 0.25 micrometers and covering an area of 2 mm X 0.6 mm were faithfully replicated at a demagnification of 1/5.

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