Physics
Scientist
ASML MaskTools, Inc., USA
ASML, USA and Motorola, USA
Application of CPL with Interference Mapping Lithography to generate random contact reticle designs for the 65-nm node
Complex 2D pattern lithography at lambda/4 resolution using chromeless phase lithography (CPL)
Contact hole reticle optimization by using interference mapping lithography (IML)
Contact hole reticle optimization by using interference mapping lithography (IML)
Near-0.3 k1 full pitch range contact hole patterning using chromeless phase lithography (CPL)
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