Statistics – Methodology
Scientist
Statistics
Methodology
Scientist
ASML MaskTools, Inc., USA
ASML Technology Development Ctr., USA
ASML, USA
ASML, USA and Motorola, USA
Application of CPL with Interference Mapping Lithography to generate random contact reticle designs for the 65-nm node
Complex 2D pattern lithography at lambda/4 resolution using chromeless phase lithography (CPL)
Contact hole reticle optimization by using interference mapping lithography (IML)
Contact hole reticle optimization by using interference mapping lithography (IML)
Effects of advanced illumination schemes on design manufacturability and interactions with optical proximity corrections
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