Physics
Scientist
Fraunhofer-Institut für Angewandte Festkoerperphysik
Effect of CH4/H2 ECR plasma etching on the electrical properties of p-type Hg1-xCdxTe
Future Infrared Detector Materials
Growth and Characterization of Materials for Infrared Detectors
Growth and Characterization of Materials for Infrared Detectors II
Infrared Detectors for Remote Sensing: Physics, Materials, and Devices
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