Physics
Optics
Scientist
FOM Institute for Plasma Physics Rijnhuizen, Netherlands
Ellipsometry with an undetermined polarization state
Enhanced performance of EUV multilayer coatings
Mo/Si multilayer coating technology for EUVL: coating uniformity and time stability
Multilayer reflectance during exposure to EUV radiation
New PTB beamlines for high-accuracy EUV reflectometry at BESSY II
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