Physics
Scientist
Greater Silicon Valley Implant Users' Group*Authors' industrial affiliations: S.B. Felch, Varian Research Center, 611 Hansen Way, Palo Alto, CA 94303, USA; L.A. Larson, National Semiconductor Corp., P.O. Box 58090, Santa Clara, CA 95052-8090, USA; M.I. Current, Applied Materials, 3050 Bowers Ave., Santa Clara, CA 95054, USA; D.W. Lindsey, Eaton / NOVA, 931 Benicia Ave, Sunnyvale, CA 94086, USA, USA
Analysis techniques of charging damage studied on three different high-current ion implanters
Reintepretation of Observed Effects of CO on Crystallization in Silicate Melts at 1-Atmosphere Pressure
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