Thin film deposition on powder surfaces using atmospheric pressure discharge

Details Thin film deposition on powder surfaces using atmospheric pressure discharge Thin film deposition on powder surfaces using atmospheric pressure discharge

Oct 2005

adsabs.harvard.edu/cgi-bin/nph-data_query?bibcode=2005aipc..799..343b&link_type=abstract

NEW VISTAS IN DUSTY PLASMAS: Fourth International Conference on the Physics of Dusty Plasmas. AIP Conference Proceedings, Volum

Other

Dusty Plasmas, Plasma Deposition, Discharges (Electric), Thin Films, Silicon Compounds, Oxygen Compounds, Dusty Or Complex Plasmas, Plasma Crystals, Plasma-Based Ion Implantation And Deposition, Other Gas Discharges

Scientific paper

The deposition of SiOx containing films on NaCl and KBr particles in dielectric barrier discharge under atmospheric pressure was investigated. As precursor hexamethyldisiloxane (HMDSO) and tetraethoxysilane (TEOS) in argon-oxygen gas mixtures were used. The deposited layers were studied by means of light microscopy, SEM and XPS investigations. The particles could be completely covered by SiOx. With increasing oxygen content in the coating the carbon content decreases.

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