Self diffusion of network formers (silicon and oxygen) in naturally occurring basaltic liquid

Computer Science

Scientific paper

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

10

Scientific paper

Self diffusion coefficients (D*) for silicon and oxygen in anhydrous basaltic liquid [O/(Si + Al) = 2.5] were measured at 1 and 2 GPa and temperatures between 1320 and 1600°C. Simple diffusion couples were composed of isotopically normal basaltic glass synthesized from chemical reagents mated to chemically identical glass enriched in 18O and 30Si. Concentrations of 18O and 30Si across the interfacial region of the couples were analyzed by ion microprobe. At 1 and 2 GPa, Do* is consistently larger than DSi* for a given diffusion couple, but only at the highest temperature (1600°C) is the difference outside the small uncertainties for the analytical measurements. At 1 GPa the self diffusivities for both Si and O are well-described by the Arrhenius relationship InD(Si.O)*=(-12.5±0.2)-(170000±2000)/RT, where T is temperature in K, R is the gas constant in J K-1 mole-1, and D* is expressed in m2 s-1. Self diffusion coefficients at 2 GPa are a factor of 1.5 greater and at 1400°C the activation volume (Va) is -6.7 cm3 mol-1. The similarity in self diffusion coefficients, small activation energies (<50% of the Si-O bonding energy), and negative activation volumes for Si and O self-diffusion in basaltic liquid suggest that network former diffusion is a largely cooperative process involving local contraction of the anionic structure. An evaluation of the Eyring η-D relationship implies a mean translation distance for network former diffusion that is 2-3 times the diameter of the oxygen ion and of the order of the Si-Si separation distance. These features of network former diffusion are consistent with the formation of high-coordinated Si as a transition complex in melts populated by Q2, Q3, and Q4 species. In light of inferred changes in melt structure with increasing silica content, we further speculate that the dominant mode of network former diffusion changes from a cooperative process in basaltic liquid, perhaps involving SiO5 transition complexes, to an ionic process (Si4+ and O2-) in liquids approaching full polymerization.

No associations

LandOfFree

Say what you really think

Search LandOfFree.com for scientists and scientific papers. Rate them and share your experience with other people.

Rating

Self diffusion of network formers (silicon and oxygen) in naturally occurring basaltic liquid does not yet have a rating. At this time, there are no reviews or comments for this scientific paper.

If you have personal experience with Self diffusion of network formers (silicon and oxygen) in naturally occurring basaltic liquid, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Self diffusion of network formers (silicon and oxygen) in naturally occurring basaltic liquid will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFWR-SCP-O-1155612

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.