W/SiC X-ray multilayers optimized for use above 100 keV

Astronomy and Astrophysics – Astronomy

Scientific paper

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

Scientific paper

We have developed a new depth-graded multilayer system comprising W and SiC layers, suitable for use as hard X-ray reflective coatings operating in the energy range 100 - 200 keV. Grazing incidence X-ray reflectance at E=8 keV was used to characterize the interface widths, as well as the temporal and thermal stability in both periodic and depth-graded W/SiC structures, while synchrotron radiation was used to measure the hard X-ray reflectance of a depth-graded multilayer designed specifically for use in the range E~150 - 170 keV. We have modeled the hard X-ray reflectance using newly-derived optical constants, which we determined from reflectance-vs-incidence angle measurements also made using synchrotron radiation, in the range E=120 - 180 keV. We describe our experimental investigation in detail, compare the new W/SiC multilayers with both W/Si and W/B4C films that have been studied previously, and discuss the significance of these results with regard to the eventual development of a hard X-ray nuclear line telescope.

No associations

LandOfFree

Say what you really think

Search LandOfFree.com for scientists and scientific papers. Rate them and share your experience with other people.

Rating

W/SiC X-ray multilayers optimized for use above 100 keV does not yet have a rating. At this time, there are no reviews or comments for this scientific paper.

If you have personal experience with W/SiC X-ray multilayers optimized for use above 100 keV, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and W/SiC X-ray multilayers optimized for use above 100 keV will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFWR-SCP-O-1170856

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.