Tuneable Capacitor based on dual picks profile of the sacrificial layer

Details Tuneable Capacitor based on dual picks profile of the sacrificial layer Tuneable Capacitor based on dual picks profile of the sacrificial layer

2008-02-21

arxiv.org/abs/0802.3078v1

Dans Symposium on Design, Test, Integration and Packaging of MEMS/MOEMS - DTIP 2007, Stresa, lago Maggiore : Italie (2007)

Computer Science

Other Computer Science

Submitted on behalf of EDA Publishing Association (http://irevues.inist.fr/EDA-Publishing)

Scientific paper

In this paper, we present a novel dual gap tuneable capacitor process based on the profile of the sacrificial layer. This profile involves a tri-layer photo-resist process with only one mask level. This realization is based on a special profile of the sacrificial layer designed by two picks. The mechanism of the sacrificial layer realisation is dependent on resist thickness, resist formulation (viscosity, type of polymer and/or solvent, additives...), design of the patterned layer (size or width) and the conditions under which this layer is prepared: thermal treatment, etch back processes... In this communication we demonstrate influence of the later parameters and discuss how a dual pick profile was achieved.

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