Thin Film Analysis via Resonant Nuclear Reaction Analysis:. Ion-Beam Mixing and Laser Surface Reactions

Statistics – Applications

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Scientific paper

Nuclear reaction analysis with capture resonances has many applications in thin film technology. The present talk describes several applications of the 15N + 1H 429 keV resonance (or its reverse reaction) for depth-profiling nitrogen (or hydrogen) after xenon ion beam irradiations of Ni3N/Si bilayers and after laser irradiations of iron, titanium and silicon in the presence of nitrogen or hydrogen.

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