The Si(3PJ) + O2 reaction: A fast source of SiO at very low temperature; CRESU measurements and interstellar consequences

Details The Si(3PJ) + O2 reaction: A fast source of SiO at very low temperature; CRESU measurements and interstellar consequences The Si(3PJ) + O2 reaction: A fast source of SiO at very low temperature; CRESU measurements and interstellar consequences

Jun 2001

adsabs.harvard.edu/cgi-bin/nph-data_query?bibcode=2001a%26a...372.1064l&link_type=abstract

Astronomy and Astrophysics, v.372, p.1064-1070 (2001)

Astronomy and Astrophysics

Astrophysics

15

Molecular Processes, Methods: Laboratory, Ism: Molecules

Scientific paper

The rate coefficient of the reaction Si(3P_J) + O_2 -> SiO + O has been measured at temperatures down to 15 K using a CRESU (Cinétique de Réaction en Écoulement Supersonique Uniforme) apparatus coupled with the PLP-LIF (Pulsed Laser Photolysis - Laser Induced Fluorescence) technique. The temperature dependence of the rate coefficient is well fitted using the expression: 1.72x 10-10 (T/300 K)-0.53 exp (-17 K/T) cm3 molecule-1 s-1 in the temperature range 15-300 K. The silicon chemistry in interstellar clouds is reviewed and possible consequences of our study are stressed.

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