The Influence Of The Ion Induced Secondary Electron Emission On The Characteristics Of RF Plasmas

Details The Influence Of The Ion Induced Secondary Electron Emission On The Characteristics Of RF Plasmas The Influence Of The Ion Induced Secondary Electron Emission On The Characteristics Of RF Plasmas

Jul 2010

adsabs.harvard.edu/cgi-bin/nph-data_query?bibcode=2010pobeo..89..131b&link_type=abstract

Publications of the Astronomical Observatory of Belgrade, vol. 89, pp. 131-134

Astronomy and Astrophysics

Astronomy

Scientific paper

In this paper the effect of the secondary emission on the characteristics of rf plasmas has been studied. Calculations were performed for a dual-frequency capacitively coupled plasma reactor by using 1d3v PIC/MCC code. In the model, the energy dependence of the yields per ion, for differently treated metal surfaces have been implemented. The obtained simulation results indicate that the plasma characteristics are greatly affected by the secondary emission processes.

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