Computer Science
Scientific paper
Sep 2003
adsabs.harvard.edu/cgi-bin/nph-data_query?bibcode=2003esasp.540..113g&link_type=abstract
In: Proceedings of the 9th International Symposium on Materials in a Space Environment, 16-20 June 2003, Noordwijk, The Netherla
Computer Science
1
Space Environment, Materials
Scientific paper
This paper presents several characterization studies of the surfaces of newly synthesized POSS-containing polyimides before and after exposure to atomic oxygen (AO). AO exposure testing was conducted independently at the University of Florida and Montana State University revealing comparable data. The exposed surfaces were characterized using X-ray photoelectron spectroscopy, and atomic oxygen erosion rates were calculated using stylus surface profilometry. The data indicate that AO induced erosion of polyimides containing POSS is drastically reduced as a result of a passivating silica layer is formed on the surface of the polymer.
Brunsvold Amy L.
Gonzalez Rene I.
Hoflund Gar B.
Minton Timothy K.
Tomczak Sandra J.
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