Slitmasks from observer to telescope: astrometric slitmask manufacturing and control for Keck spectrographs

Details Slitmasks from observer to telescope: astrometric slitmask manufacturing and control for Keck spectrographs Slitmasks from observer to telescope: astrometric slitmask manufacturing and control for Keck spectrographs

Sep 2004

adsabs.harvard.edu/cgi-bin/nph-data_query?bibcode=2004spie.5496..506c&link_type=abstract

Advanced Software, Control, and Communication Systems for Astronomy. Edited by Lewis, Hilton; Raffi, Gianni. Proceedings of th

Astronomy and Astrophysics

Astronomy

Scientific paper

This paper documents the astrometric slitmask design, submission, fabrication, control and configuration tools used for two large spectrographs at W. M. Keck Observatory on Mauna Kea, Hawai'i. For supplemental illustrations and documents, including an online version of the poster and interactive demos, we refer the reader to http://spg.ucolick.org/Docs/SPIE/2004 .

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