Semiconductor fabrication techniques for producing an ultra-flat reflective slit

Details Semiconductor fabrication techniques for producing an ultra-flat reflective slit Semiconductor fabrication techniques for producing an ultra-flat reflective slit

Jul 2006

adsabs.harvard.edu/cgi-bin/nph-data_query?bibcode=2006spie.6273e..60v&link_type=abstract

Optomechanical Technologies for Astronomy. Edited by Atad-Ettedgui, Eli; Antebi, Joseph; Lemke, Dietrich. Proceedings of the S

Astronomy and Astrophysics

Astronomy

Scientific paper

The most difficult aspects in manufacturing a reflective slit substrate are achieving a precisely fabricated slit surrounded by an optically flat surface. A commonly used technique is to polish a metal substrate that has a slit cut by electric discharge machine (EDM) methods. This process can produce 'optically flat' surfaces; however, the EDM can produce a slit with edge roughness on the order of 10 microns and a RMS field roughness of ~1 micron. Here, we present a departure from these traditional methods and employ the advantages inherent in integrated circuit fabrication. By starting with a silicon wafer, we begin with a nearly atomically flat surface. In addition, the fabrication tools and methodologies employed are traditionally used for high precision applications: this allows for the placement and definition of the slit with high accuracy. If greater accuracy in slit definition is required, additional tools, such as a focused ion beam, are used to define the slit edge down to tens of nanometers. The deposition of gold, after that of a suitable bonding layer, in an ultra-high vacuum chamber creates a final surface without the need of polishing. Typical results yield a surface RMS-roughness of approximately 2nm. Most of the techniques and tools required for this process are commonly available at research universities and the cost to manufacture said mirrors is a small fraction of the purchase price of the traditional ones.

Affiliated with

Also associated with

No associations

Rating

Semiconductor fabrication techniques for producing an ultra-flat reflective slit does not yet have a rating. At this time, there are no reviews or comments for this scientific paper.

If you have personal experience with Semiconductor fabrication techniques for producing an ultra-flat reflective slit, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Semiconductor fabrication techniques for producing an ultra-flat reflective slit will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFWR-SCP-O-1893379