Recent advances in blazed grating fabrication by electron-beam lithography

Details Recent advances in blazed grating fabrication by electron-beam lithography Recent advances in blazed grating fabrication by electron-beam lithography

Nov 2003

adsabs.harvard.edu/cgi-bin/nph-data_query?bibcode=2003spie.5173..115w&link_type=abstract

Current Developments in Lens Design and Optical Engineering IV. Edited by Mouroulis, Pantazis Z.; Smith, Warren J.; Johnson, R.

Computer Science

5

Scientific paper

Convex and concave diffraction gratings are required for concentric imaging spectrometer forms. Direct-write electron-beam lithography has proven to be an effective method for fabricating high-efficiency blazed gratings on non-flat substrates. Recently fabricated convex gratings have demonstrated relative efficiency greater than 90%, diffuse scatter and ghosts less than 5x10-4 of the main diffraction order, and zeroth-order wavefront error less than 1/4-wave at 633 nm. Such gratings can be fabricated on JPL"s JEOL JBX-9300FS electron-beam lithography system with a writing speed of approximately 1 to 2 cm2 per hour. The technique was recently used to fabricate flight-qualified gratings for the Compact Reconnaissance Imaging Spectrometer for Mars (CRISM) instrument that is scheduled to fly on the NASA Mars Reconnaissance Orbiter in 2005.

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