Process control methods for THz Schottky-based components

Details Process control methods for THz Schottky-based components Process control methods for THz Schottky-based components

Dec 2002

adsabs.harvard.edu/cgi-bin/nph-data_query?bibcode=2002esasp.507..317i&link_type=abstract

Proceedings of the European Space Components Conference, ESCCON 2002, 24-27 September 2002, Toulouse, France. Compiled by R.A. H

Statistics

Applications

Scientific paper

Process control methods are applied to the fabrication technology of single planar varactor Schottky diodes for THz applications. Consequently, the scattering of electrical parameters is reduced by >30 %, whereas the average yield increases from 7 % to 40 %, in spite of the manual fabrication process. Additionally, the breakdown voltage increases by >2 V, and the series resistance decreases by 5 Ω, whereas the ideality factor remains below 1.06.

Affiliated with

Also associated with

No associations

Rating

Process control methods for THz Schottky-based components does not yet have a rating. At this time, there are no reviews or comments for this scientific paper.

If you have personal experience with Process control methods for THz Schottky-based components, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process control methods for THz Schottky-based components will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFWR-SCP-O-964356