Precise optical evaluation using phase measuring interferometric techniques

Details Precise optical evaluation using phase measuring interferometric techniques Precise optical evaluation using phase measuring interferometric techniques

Jan 1979

adsabs.harvard.edu/cgi-bin/nph-data_query?bibcode=1979spie..192...65g&link_type=abstract

In: Interferometry; Proceedings of the Seminar, San Diego, Calif., August 29, 30, 1979. (A80-44308 19-35) Bellingham, Wash., Soc

Computer Science

Graphics

1

Fabrication, Interferometers, Optical Properties, Phase Deviation, Surface Properties, Computer Graphics, Metrology, Minicomputers, Mirrors, Systems Engineering

Scientific paper

The use of phase measuring interferometry (PMI) for the evaluation of optical elements and optical systems is discussed. The technique is based on the conversion of optical wavefront phase over a two-dimensional interference plane into an electronic signal array combined with electronic Fourier analysis to determine signal phase independent of signal amplitude. The PMI system presented which is designed to produce high-quality reflecting spheres, flats, mirrors, and refractive elements, has a measuring uncertainty of less than 0.01 wavelength peak-to-valley and 0.001 wavelength rms.

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