Pad polishing for rapid production of large flats

Details Pad polishing for rapid production of large flats Pad polishing for rapid production of large flats

Oct 1997

adsabs.harvard.edu/cgi-bin/nph-data_query?bibcode=1997spie.3134..252b&link_type=abstract

Proc. SPIE Vol. 3134, p. 252-257, Optical Manufacturing and Testing II, H. Philip Stahl; Ed.

Other

1

Scientific paper

Pad polishing is an efficient technique for polishing-out a ground surface and reaching a figure better than one wave, ready for completion with less than an hour on a planetary polisher. Recent work has shown success on 350 mm square parts; current work involves scaling the process to 1.4 meter diameter. For the 350 mm square piece of BK7, removal was one micrometer every 10 minutes. Polishing-out from a 5 micrometer grind took less than 3 hours, to a surface smoothness of one nm rms. Other tests verified that the pad leaves no unusual subsurface damage. Following completion on a pitch planetary polisher, surface finish is the same as obtained for conventional processing.

Affiliated with

Also associated with

No associations

Rating

Pad polishing for rapid production of large flats does not yet have a rating. At this time, there are no reviews or comments for this scientific paper.

If you have personal experience with Pad polishing for rapid production of large flats, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Pad polishing for rapid production of large flats will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFWR-SCP-O-1158769