On-the-fly writing of a long grating phase mask

Details On-the-fly writing of a long grating phase mask On-the-fly writing of a long grating phase mask

Mar 2011

adsabs.harvard.edu/cgi-bin/nph-data_query?bibcode=2011opten..50c8001m&link_type=abstract

Optical Engineering, Volume 50, Issue 3, pp. 038001-038001-9 (2011).

Computer Science

Collimators, Diffraction Gratings, Laser Beams, Nanotechnology, Photoresists, Substrates, Beam Characteristics: Profile, Intensity, And Power, Spatial Pattern Formation, Fabrication Techniques, Lithography, Pattern Transfer, Gratings

Scientific paper

A method is demonstrated for writing long grating phase masks, which can be used for patterning large-area (square meter size) submicron-period gratings. The method consist of illuminating a small area transmission grating phase mask by a continous wavetransverse-electric-polarized collimated laser beam under the -1st order Littrow mounting to define a high-contrast interferogram composed of fringes. By sliding a long photoresist-coated substrate under this small area phase mask, gratings of arbitrary length may be written, with grating lines oriented in the scan direction. The patterning of uninterrupted gratings with lengths exceeding 300 mm is demonstrated.

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