On the determination of Poisson's ratio of stressed monolayer and bilayer submicron thick films

Details On the determination of Poisson's ratio of stressed monolayer and bilayer submicron thick films On the determination of Poisson's ratio of stressed monolayer and bilayer submicron thick films

2008-05-07

arxiv.org/abs/0805.0899v1

Dans Symposium on Design, Test, Integration and Packaging of MEMS/MOEMS - DTIP 2008, Nice : France (2008)

Computer Science

Other Computer Science

Submitted on behalf of EDA Publishing Association (http://irevues.inist.fr/handle/2042/16838)

Scientific paper

In this paper, the bulge test is used to determine the mechanical properties of very thin dielectric membranes. Commonly, this experimental method permits to determine the residual stress (s0) and biaxial Young's modulus (E/(1-u)). Associating square and rectangular membranes with different length to width ratios, the Poisson's ratio (u) can also be determined. LPCVD Si3N4 monolayer and Si3N4/SiO2 bilayer membranes, with thicknesses down to 100 nm, have been characterized giving results in agreement with literature for Si3N4, E = 212 $\pm$ 14 GPa, s0 = 420 $\pm$ 8 and u = 0.29.

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