Negative-ion plasma sources

Details Negative-ion plasma sources Negative-ion plasma sources

Aug 1988

adsabs.harvard.edu/cgi-bin/nph-data_query?bibcode=1988rsci...59.1369s&link_type=abstract

Review of Scientific Instruments (ISSN 0034-6748), vol. 59, Aug. 1988, pt. 1, p. 1369-1375.

Computer Science

39

Electron Density (Concentration), Electron Plasma, Negative Ions, Plasma Density, Sulfur Fluorides, Tungsten Fluorides, Computerized Simulation, Cyclotron Frequency, Stellar Atmospheres, Stellar Magnetospheres

Scientific paper

Three designs for negative-ion plasma sources are described. Two sources utilize metal hexafluorides such as SF6 and WF6 to scavenge electrons from electron-ion plasmas and the third relies upon surface ionization of alkali halide salts on heated alumina and zirconia. SF6 introduced into electron-ion plasmas yielded negative-ion plasma densities of 10 to the 10th/cu cm with low residual electron densities. On alumina, plasma densities of 10 to the 9th/cu cm were obtained for CsCl, CsI, and KI and 10 to the 9th/cu cm for KCl. On zirconia 10 to the 10th/cu cm densities were obtained for CsCl. For alkali halide sources, electron densities of less than about 10 to the -4th have been achieved.

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